Polishing technology must respond to evolving demand in the market.
Rubicon is intent on becoming the industry leader by discovering and developing potential yield-improving surface technologies. This ensures the company’s place in setting tomorrow’s specifications and achieving even greater improvements in customer yields.
ES2-PSA
Our proprietary ES2-PSA technology redefines the state-of-the-art for epitaxial polishing of sapphire. The ES2-PSA process makes possible ultra-flat, super-clean sapphire substrates with precision orientations and offsets, and wafer-to-wafer uniformity. Sizes include 150mm diameter substrates today with development programs underway to produce 200mm and larger diameter wafers in the future.
Large Diameter Epitaxy-ready Substrates
Optical Polishing