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Polishing technology must respond to evolving demand in the market.

 

Rubicon is intent on becoming the industry leader by discovering and developing potential yield-improving surface technologies. This ensures the company’s place in setting tomorrow’s specifications and achieving even greater improvements in customer yields.

 

ES2-PSA
Our proprietary ES2-PSA technology redefines the state-of-the-art for epitaxial polishing of sapphire. The ES2-PSA process makes possible ultra-flat, super-clean sapphire substrates with precision orientations and offsets, and wafer-to-wafer uniformity. Sizes include 150mm diameter substrates today with development programs underway to produce 200mm and larger diameter wafers in the future.

 

 

      Large Diameter Epitaxy-ready Substrates

 

      Optical Polishing